Improve and maintain the advanced photomasks that optimize the performance of the Advanced ASML lithography scanners in the 300mm cleanroom.
What you will do
As the power of EUV light sources continues to increase in future ASML lithography systems, optimizing and maintaining photomask performance becomes an increasingly critical challenge. As an R&D Engineer, you will help develop the technologies and processes that optimize photomask imaging performance and ensure photomasks remain defect-free and production-ready throughout their operational lifetime.
You will work on some of the most challenging aspects of advanced lithography, including mask architecture, cleaning, contamination control, handling-induced degradation, and mask lifetime management. By linking mask condition to wafer printing performance, you will bridge the gap between process engineering, materials science, and lithography system performance.
Your research will contribute directly to imec’s advanced patterning program and support the development of future semiconductor manufacturing technologies. Through experimental work, process development, and data-driven optimization, you will help ensure that photomasks continue to meet the demanding requirements of next-generation EUV and High-NA EUV lithography.
Your responsibilities
- Collaborate with multidisciplinary teams to translate insights into practical solutions that improve mask performance, scanner productivity, and patterning capability.
- Analyze wafer lithography and mask performance data to understand the impact of mask architecture, aging, contamination, handling, storage, exposure, and maintenance on printing performance. Develop, qualify, and optimize mask cleaning processes to ensure consistent mask quality and lifetime.
- Apply a strong analytical approach, supported by experimental investigations and literature review, to identify and understand the physical and chemical mechanisms driving mask performance and degradation.
- Develop and evaluate mitigation strategies that minimize mask degradation and maximize mask lifetime for current EUV lithography systems, while anticipating the challenges associated with future generations of higher-power EUV and High-NA lithography scanners.
- Contribute to the development of next-generation mask maintenance and contamination-control concepts that enable the continued scaling of semiconductor manufacturing technologies.
Training and Development
You will begin your journey with an intensive onboarding and training program at imec in Leuven, gaining hands-on experience with state-of-the-art lithography equipment, EUV photomask technology, and advanced semiconductor manufacturing processes.
During this period, you will:
- Build a solid understanding of EUV photomask technology, including mask architecture, performance, degradation mechanisms, contamination control, and mask lifetime management.
- Develop in-depth knowledge of advanced lithography systems, their operating principles, and the expected evolution toward higher-power EUV and High-NA EUV platforms.
- Learn to operate and interpret data from imec’s advanced mask-processing and metrology equipment, including mask CD-SEMs for critical dimension characterization and mask cleaning systems for particle and contamination removal.
- Gain practical experience in analyzing lithography and metrology data to establish links between mask condition, process performance, and wafer-printing results.
- Work closely with experienced researchers and engineers, developing the technical expertise needed to contribute to next-generation lithography and photomask technologies.
- This training will provide a strong foundation for your future role and enable you to contribute rapidly to imec’s world-leading research programs in advanced patterning and EUV lithography.
Your Future Impact
Following your training, you will join a multidisciplinary team of lithography, photomask, and e-beam technology experts. In this role, you will play a key part in enabling next-generation semiconductor research by ensuring that imec’s advanced photomasks maintain their performance and integrity throughout the exposure of thousands of wafers.
Working closely with the lithography team, you will bridge the fields of mask technology, scanner performance, and data analytics to understand how mask condition impacts wafer printing results. By identifying degradation mechanisms and developing effective maintenance and mitigation strategies, you will help maximize mask lifetime, scanner productivity, and patterning performance.
Your contributions will directly support imec’s advanced patterning research programs and help address the challenges associated with future generations of higher-power EUV and High-NA lithography systems. Through your work, you will enable the reliable use of some of the world's most advanced photomasks and contribute to the continued scaling of semiconductor technology
What we do for you
We offer you the opportunity to join one of the world’s premier research centers in nanotechnology at its headquarters in Leuven, Belgium. With your talent, passion and expertise, you’ll become part of a team that makes the impossible possible. Together, we shape the technology that will determine the society of tomorrow.
We are committed to being an inclusive employer and proud of our open, multicultural, and informal working environment with ample possibilities to take initiative and show responsibility. We commit to supporting and guiding you in this process; not only with words but also with tangible actions. Through imec.academy, 'our corporate university', we actively invest in your development to further your technical and personal growth.
We are aware that your valuable contribution makes imec a top player in its field. Your energy and commitment are therefore appreciated by means of a market appropriate salary with many fringe benefits.
Who you are
- PhD or Master’s degree in applied physics, Material sciences, Engineering Sciences, or a related technical field.
- Experience with data analysis, data visualization, and software development.
- Analytical mindset with a passion for solving complex technical challenges.
- Strong communication skills in English and Dutch, both written and verbal.
- Ability to work effectively in multidisciplinary teams and collaborate with industrial partners.
- Strong communication skills and a proactive approach to innovation and problem solving.
- Experience with advanced lithography, photomask technology, are an asset.
This position offers a unique opportunity to work with the world's most advanced lithography systems and contribute directly to the technologies that will enable future generations of semiconductor devices.
